Sikyung Lim

Title: Innovations by Sikyung Lim in Photomask Technology

Introduction

Sikyung Lim is a notable inventor based in Yongin-si, South Korea. He has made significant contributions to the field of photomask technology, particularly in managing critical dimension errors. His innovative approach has implications for the manufacturing processes in the semiconductor industry.

Latest Patents

Sikyung Lim holds a patent titled "Method of managing critical dimension error of photomask and method of manufacturing photomask using the method." This patent outlines a method that includes defining openings in a photomask, utilizing graphs to analyze light transmission, and calculating the real width of openings to enhance the accuracy of photomask manufacturing.

Career Highlights

Sikyung Lim is currently employed at Samsung Display Co., Ltd., where he applies his expertise in photomask technology. His work is crucial in ensuring the precision required in modern display technologies. Lim's innovative methods contribute to the overall efficiency and effectiveness of manufacturing processes in the industry.

Collaborations

He has collaborated with notable colleagues, including Jaehyuk Chang and Taejoon Kim, to further advance the field of photomask technology. Their combined efforts have led to significant improvements in the accuracy and reliability of photomask manufacturing.

Conclusion

Sikyung Lim's contributions to photomask technology exemplify the importance of innovation in the semiconductor industry. His patent and collaborative efforts highlight the ongoing advancements in managing critical dimension errors, which are essential for the future of display technologies.