Samsung Display Co., Ltd.

Sikyung Lim

Taejoon Kim

Jaehyuk Chang

Hyunkyu Sun

A method of managing a critical dimension error includes (i) defining, in a photomask, N openings having a width, where N is a natural number, (ii) using graphs for each of the N openings, each of the graphs being obtained by setting locations through an opening of the N openings as a first axis and an intensity of transmitting light as a second axis, obtaining ILSproportional to an inclination of a tangent to a graph of the graphs at a location corresponding to an edge of an opening and Iwhich is an intensity of transmitting light at the location, where i is a natural number from 1 to N, (iii) obtaining, with respect to each of the N openings, a real width CDof the openings, and (iv) when obtaining AIMEEFwhich is an aerial image mask error enhancement factor with respect to each of the N openings according to an equation below:

Growing community of inventors

Yongin-si, South Korea

Sikyung Lim