Company Filing History:
1 out of 25 
1 out of 2 Years Active: 1999-2000
Title: Sigurd Guenter Hagen: Pioneer in Photoresist Technology
Introduction: Sigurd Guenter Hagen, a noted inventor from Binzen, Germany, has made significant contributions to the field of photoresist technology. With two patents to his name, his innovations are particularly relevant in the realms of microelectronics and photolithography.
Latest Patents: Hagen's latest patents include a negatively acting photoresist composition based on polyimide precursors. This innovative composition features a polyimide precursor that contains repeating structural units, allowing the photoresist to be developed using aqueous-alkaline developers, which are free of organic solvents. His other notable patent is for a negative working photoresist composition based on polyimide primers, which further enhances the efficiency and effectiveness of the photoresist applications in the semiconductor industry.
Career Highlights: Throughout his career, Sigurd Guenter Hagen has been associated with Olin Microelectronic Chemicals, Inc. and Olin Microelectronics Chemicals, Inc., where he significantly influenced the development and improvement of photoresist materials. His work has played a crucial role in advancing technologies that are vital for modern electronics manufacturing.
Collaborations: During his career, Hagen worked alongside Nadia Reichlin, with whom he collaborated on various projects involving photoresist technologies. Their teamwork has contributed to innovative developments in the field, enhancing both the functionality and reliability of photoresist compositions.
Conclusion: Sigurd Guenter Hagen's contributions to the field of photoresist technology have established him as a key inventor in this domain. His patents are not only significant for his career but also for the broader advancements in microelectronics. As technology continues to evolve, Hagen’s work remains a testament to the importance of innovation in scientific research and application.