Siddha Pimputkar

Title: Siddha Pimputkar: Innovator in Chemical Vapor Deposition Technology

Introduction

Siddha Pimputkar is a notable inventor based in Goleta, California. He has made significant contributions to the field of chemical vapor deposition, holding a total of 5 patents. His work focuses on innovative processes and apparatuses for forming thin films on substrates.

Latest Patents

Among his latest patents is a high-pressure spatial chemical vapor deposition system and related process. This invention discloses apparatuses designed for forming thin films on a substrate through a unique method involving plural process chambers that are fluidly isolated from each other. Each chamber contains a different source gas comprising one or more volatile reactive species. The substrate is supported beneath the chambers on a rotating heated susceptor, allowing for consecutive exposure to the reactive species. This innovative approach enables the growth of thin films at high pressures exceeding 1 atmosphere. Another notable patent involves the ammonothermal growth of group-III nitride crystals on seed crystals with surfaces forming acute, right, or obtuse angles with each other, facilitating the creation of concave surfaces.

Career Highlights

Siddha Pimputkar has worked at prestigious institutions such as the University of California and Lehigh University. His experience in these academic environments has contributed to his development as an inventor and researcher in the field of chemical engineering.

Collaborations

Throughout his career, Siddha has collaborated with esteemed colleagues, including James Stephen Speck and Shuji Nakamura. These partnerships have likely enriched his research and innovation efforts.

Conclusion

Siddha Pimputkar's contributions to chemical vapor deposition technology and his innovative patents highlight his role as a significant figure in the field. His work continues to influence advancements in thin film technology and materials science.