Hanam, South Korea

Si-Young Jung

This inventor holds 1 USPTO granted patent. Top assignees: Az Electronic Materials (Japan) K.k., Samsung Electronics Co., Ltd.. Active years: 2011.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Si-Young Jung. Retrieved from https://idiyas.com/inventor/si-young-jung-u37lzer5

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2011

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Si-Young Jung: Innovator in Photoresist Technology

Introduction

Si-Young Jung is a notable inventor based in Hanam-si, South Korea. She has made significant contributions to the field of photoresist technology, particularly in the manufacturing of thin-film transistor substrates. Her innovative approach has led to advancements that enhance the performance and reliability of electronic devices.

Latest Patents

Si-Young Jung holds a patent for a photoresist composition and method of manufacturing a thin-film transistor substrate using the same. The patent describes a photoresist composition that includes about 100 parts by weight of a resin mixture, which consists of novolak resin and acryl resin, along with about 10 to 50 parts by weight of naphthoquinone diazosulfonic acid ester. The novolak resin has a weight-average molecular weight of no less than about 30,000, while the acryl resin has a weight-average molecular weight of no less than about 20,000. The acryl resin constitutes about 1% to 15% of the total weight of the resin mixture. This composition allows for a photoresist film that, when heated, exhibits minimal profile variation, resulting in a uniform thickness. Consequently, this innovation helps reduce short circuits and open defects in thin-film transistor substrates.

Career Highlights

Throughout her career, Si-Young Jung has worked with prominent companies in the electronics industry. She has been associated with Samsung Electronics Co., Ltd. and Az Electronic Materials (Japan) K.K. Her experience in these organizations has contributed to her expertise in photoresist technology and its applications in modern electronics.

Collaborations

Si-Young Jung has collaborated with notable colleagues, including Hi-Kuk Lee and Woo-Seok Jeon. These collaborations have fostered an environment of innovation and have led to advancements in their respective fields.

Conclusion

Si-Young Jung's contributions to photoresist technology exemplify her dedication to innovation in the electronics industry. Her patent and career achievements highlight her role as a significant inventor in this field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…