The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 07, 2011
Filed:
Oct. 30, 2006
Hi-kuk Lee, Yongin-si, KR;
Woo-seok Jeon, Seoul, KR;
Doo-hee Jung, Seoul, KR;
Jeong-min Park, Seoul, KR;
Deok-man Kang, Seongnam-si, KR;
Si-young Jung, Hanam-si, KR;
Jae-young Choi, Suwon-si, KR;
Hi-Kuk Lee, Yongin-si, KR;
Woo-Seok Jeon, Seoul, KR;
Doo-Hee Jung, Seoul, KR;
Jeong-Min Park, Seoul, KR;
Deok-Man Kang, Seongnam-si, KR;
Si-Young Jung, Hanam-si, KR;
Jae-Young Choi, Suwon-si, KR;
Abstract
A photoresist composition includes about 100 parts by weight of resin mixture including novolak resin and acryl resin and about 10 parts to about 50 parts by weight of naphthoquinone diazosulfonic acid ester. A weight-average molecular weight of the novolak resin is no less than about 30,000. A weight-average molecular weight of the acryl resin is no less than about 20,000. The acryl resin makes up about 1% to about 15% of the total weight of the resin mixture. When a photoresist film formed using the photoresist composition is heated, a profile variation of the photoresist composition is relatively small. Therefore, a residual photoresist film has a uniform thickness, and a short circuit and/or an open defect in a TFT substrate may be reduced.