Si-Ok Sohn

Title: Si-Ok Sohn: Innovator in Semiconductor Technology

Introduction

Si-Ok Sohn is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on advanced semiconductor devices, particularly in the area of fin field effect transistors.

Latest Patents

Sohn's latest patents include a semiconductor device that features a fin field effect transistor and a method for manufacturing it. This invention involves an active pattern with insulating layer patterns, an isolation layer pattern, and a gate electrode that fills an opening exposing the sidewall of the active pattern. Additionally, he has developed a semiconductor device that includes a buried isolation pattern between an active pattern and a substrate. This design enhances control over the body effect caused by substrate bias, showcasing his innovative approach to semiconductor design.

Career Highlights

Si-Ok Sohn is currently employed at Samsung Electronics Co., Ltd., a leading company in the technology sector. His work at Samsung has allowed him to push the boundaries of semiconductor technology and contribute to the company's reputation for innovation.

Collaborations

Throughout his career, Sohn has collaborated with notable colleagues, including Jong-Man Park and Sang-Yeon Han. These partnerships have fostered a creative environment that has led to groundbreaking advancements in semiconductor technology.

Conclusion

Si-Ok Sohn's contributions to the field of semiconductor technology are noteworthy, and his patents reflect his innovative spirit. His work continues to influence the industry and pave the way for future advancements in semiconductor devices.