Shyam Agarwal

Title: Shyam Agarwal - Innovator in FinFET Technology

Introduction

Shyam Agarwal is a prominent inventor based in Hwasung-si, South Korea. He has made significant contributions to the field of semiconductor technology, particularly in FinFET design techniques. With a total of 5 patents to his name, Agarwal continues to push the boundaries of innovation in his field.

Latest Patents

One of Agarwal's latest patents is titled "Method for high performance standard cell design techniques in FinFET based library using local layout effects (LLE)." This inventive concept describes a method for high-performance standard cell design techniques in a FinFET-based library utilizing local layout effects. The patent outlines a fabrication process that employs a standard FinFET cell layout featuring double diffusion breaks (DDBs) and single diffusion breaks (SDBs). In one embodiment, the method involves removing one or more fingers of a P-type FinFET (PFET) from the standard layout. Following this removal, a Half-Double Diffusion Break (Half-DDB) is introduced on the N-type FinFET (NFET) side within the cell boundary using a cut-poly layer. This cut-poly layer not only isolates the PFET and NFET gates but also becomes an integral part of the hybrid structure. Additionally, the removed PFET gate fingers are converted into two floating PFET gates by shorting the drain and source terminals to a common power net.

Another notable patent is the "Low power integrated clock gating system and method." This invention includes an apparatus featuring a latch circuit that, depending on a state or at least one enable signal, passes a clock signal to an output signal. The latch circuit comprises an input stage controlled by the clock signal and the enable signal(s). The output stage is designed to produce the output signal, with both stages sharing a common transistor controlled by the clock signal.

Career Highlights

Shyam Agarwal is currently employed at Samsung Electronics Co., Ltd., where he applies his expertise in semiconductor technology. His work has been instrumental in advancing the capabilities of FinFET technology, contributing to the development of more efficient and powerful electronic devices.

Collaborations

Agarwal has collaborated with notable colleagues, including Abhishek Ghosh and Parvinder Kumar Rana. These collaborations have fostered a creative environment that encourages innovation and