Jhudong, Taiwan

Shy-Jay Shin

This inventor holds 1 USPTO granted patent. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shy-Jay Shin. Retrieved from https://idiyas.com/inventor/shy-jay-shin

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2015

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1 patent (USPTO):Explore Patents

Title: Shy-Jay Shin: Innovator in Image Dithering for Lithographic Processes

Introduction

Shy-Jay Shin is a notable inventor based in Jhudong, Taiwan. He has made significant contributions to the field of lithographic processes through his innovative methods. His work focuses on enhancing image quality in integrated circuit (IC) layout designs.

Latest Patents

Shy-Jay Shin holds a patent for a "Method for image dithering for lithographic processes." This patent outlines a comprehensive method that includes providing a polygon related to an IC layout design in a graphic database system (GDS) grid. The process involves converting the polygon to an intensity map, performing quantization processes, and distributing errors to achieve optimal image quality. He has 1 patent to his name.

Career Highlights

Shy-Jay Shin is associated with Taiwan Semiconductor Manufacturing Company Limited, a leading player in the semiconductor industry. His role in the company has allowed him to work on cutting-edge technologies that drive advancements in lithography.

Collaborations

Shy-Jay collaborates with talented individuals such as Cheng-Hung Chen and Jaw-Jung Shin, who contribute to his innovative projects. Their teamwork fosters an environment of creativity and technical excellence.

Conclusion

Shy-Jay Shin's contributions to image dithering methods in lithographic processes highlight his role as an influential inventor in the semiconductor field. His innovative approach continues to impact the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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