Shuzo Hattori

Title: Shuzo Hattori: Innovator in Fluoroalkyl Acrylate Polymer Technology

Introduction

Shuzo Hattori is a prominent inventor based in Nagoya, Japan, known for his significant contributions to the field of polymer technology. With a total of 11 patents to his name, Hattori has made remarkable advancements, particularly in the development of fluoroalkyl acrylate polymer films.

Latest Patents

One of Hattori's latest patents involves a process for forming a fluoroalkyl acrylate polymer film on a substrate through plasma polymerization. This innovative film exhibits high sensitivity to high energy rays and excellent resolving power, making it highly useful as a resist film. The plasma polymerized film is characterized by minimal pinholes and durability against dry etching. A patterned resist film can be created by irradiating the film with high energy rays to form a latent pattern, which can then be developed using either a wet process with a solvent or oxygen-containing gas plasma etching. Additionally, patterns can be formed solely through electron beam irradiation, with the process being enhanced by heat treatment or plasma treatment.

Career Highlights

Throughout his career, Shuzo Hattori has worked with notable companies such as Kimmon Electric Co., Ltd. and Daikin Kogyo Co., Ltd. His work in these organizations has contributed to the advancement of polymer technologies and their applications in various industries.

Collaborations

Hattori has collaborated with esteemed colleagues, including Shinzo Morita and Tsuneo Fujii, further enriching his research and development efforts in the field of polymer science.

Conclusion

Shuzo Hattori's innovative work in fluoroalkyl acrylate polymer technology has positioned him as a key figure in the field. His patents and collaborations reflect his commitment to advancing polymer applications, making significant contributions to the industry.