The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 11, 1981
Filed:
Mar. 25, 1980
Applicant:
Inventors:
Shuzo Hattori, Nagoya, JP;
Shinzo Morita, Nagoya, JP;
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ; B44C / ; C03C / ; C03C / ;
U.S. Cl.
CPC ...
430296 ; 156643 ; 156646 ; 2041 / ; 2041 / ; 427 41 ; 427 431 ; 427259 ; 430328 ;
Abstract
A plasma-polymerized film formed on the surface of a substrate is found to be suitable for subsequent use in electron-beam lithography and the film exposed to a beam of electrons is then developed to provide it with the predetermined pattern. These steps of plasma polymerization, electron-beam exposure and development can be consecutively carried out in vapor phase within a unified vacuum apparatus.