Nanchang, China

Shuyu Long

This inventor holds 1 USPTO granted patent. Top assignee: Nanchang University. Active years: 2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shuyu Long. Retrieved from https://idiyas.com/inventor/shuyu-long

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 22.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: Innovations by Shuyu Long in Plasma Measurement

Introduction

Shuyu Long is an accomplished inventor based in Nanchang, China. He has made significant contributions to the field of plasma measurement through his innovative methods. His work focuses on the nonextensive parameters of plasma, which are crucial for various applications in physics and engineering.

Latest Patents

Shuyu Long holds a patent titled "Method for measuring plasma ion nonextensive parameter." This invention presents a novel approach to measuring the ion nonextensive parameter of plasma. The method involves describing plasma using nonextensive statistical mechanics and obtaining an equation that relates the geodesic acoustic mode frequency to the ion acoustic speed of plasma. The process includes collecting measurement data and using it to derive the ion nonextensive parameter numerically.

Career Highlights

Shuyu Long is affiliated with Nanchang University, where he continues to advance research in plasma physics. His work has filled a critical gap in the diagnosis of ion nonextensive parameters, complementing existing methods for measuring electron nonextensive parameters. This advancement is significant for researchers and practitioners in the field.

Collaborations

Shuyu Long has collaborated with notable colleagues, including Huibin Qiu and Zuozhi Hu. Their combined expertise enhances the research output and innovation in their respective fields.

Conclusion

Shuyu Long's contributions to plasma measurement through his patented method demonstrate his innovative spirit and dedication to advancing scientific knowledge. His work is poised to impact the field significantly.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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