Shenzhen, China

Shuyu Ke

This inventor holds 2 USPTO granted patents. Top assignee: Hkc Corporation Limited. Active years: 2024-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shuyu Ke. Retrieved from https://idiyas.com/inventor/shuyu-ke

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2024-2025

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2 patents (USPTO):Explore Patents

Title: Shuyu Ke: Innovator in Display Technology

Introduction

Shuyu Ke is a prominent inventor based in Shenzhen, China. He has made significant contributions to the field of display technology, holding a total of 2 patents. His work focuses on enhancing the functionality and efficiency of display panels.

Latest Patents

Shuyu Ke's latest patents include a color filter substrate, a method for manufacturing the same, and a display panel. The color filter substrate comprises a substrate, a black matrix layer, a first filler, and a positioning mark. The black matrix layer is strategically arranged on the substrate, with a groove defined in the black matrix layer surrounding the display area of the substrate. The filler is placed inside the groove, while the positioning mark, which has a different color from that of the first filler, is also located within the groove.

Career Highlights

Shuyu Ke is currently employed at Hkc Corporation Limited, where he continues to innovate in the field of display technology. His expertise and dedication have led to advancements that benefit the industry.

Collaborations

Shuyu collaborates with Haoxuan Zheng, a talented woman in the field, contributing to the development of cutting-edge technologies.

Conclusion

Shuyu Ke's contributions to display technology through his patents and collaborations highlight his role as an influential inventor in the industry. His work continues to pave the way for future innovations in display technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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