This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: C.uyemura Co., Ltd.. Active years: 2014.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2014
Title: Shunsaku Hoshi: Innovator in Continuous Copper Electroplating
Introduction
Shunsaku Hoshi is a notable inventor based in Hirakata, Japan. He has made significant contributions to the field of electroplating, particularly with his innovative methods that enhance the efficiency and quality of copper plating processes. His work is recognized for addressing common challenges in the electroplating industry.
Latest Patents
Hoshi holds a patent for a "Continuous Copper Electroplating Method." This method involves a repeated electroplating process where a workpiece is plated as a cathode using an insoluble anode in a copper sulfate plating bath. The process includes a unique copper dissolution vessel that allows for the circulation of the plating bath, ensuring that copper ions consumed during plating are replenished. This innovative approach prevents defective plating by oxidizing and decomposing components that impair plating performance.
Career Highlights
Shunsaku Hoshi has dedicated his career to advancing electroplating technologies. His patent reflects his commitment to improving industrial processes and enhancing product quality. Hoshi's work has implications for various applications, making him a valuable asset in the field of materials engineering.
Collaborations
Hoshi has collaborated with notable colleagues, including Toshihisa Isono and Tomohiro Kawase. Their combined expertise has contributed to the development of advanced electroplating techniques and has fostered innovation within their organization.
Conclusion
Shunsaku Hoshi's contributions to the field of electroplating through his patented methods demonstrate his innovative spirit and dedication to improving industrial processes. His work continues to influence the electroplating industry, paving the way for future advancements.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile