This inventor holds 6 USPTO granted patents and 1 published patent application. Top assignees: Hubei Dinglong Chemical Co., Ltd., Hubei Dinghui Microelectronics Materials Co., Ltd, Hubei Dinglong Co., Ltd.. Active years: 2011-2021.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
4 out of 7 
1 out of 2 
1 out of 1 Years Active: 2011-2021
Title: Innovations of Shunquan Zhu in Polishing Technology
Introduction
Shunquan Zhu is a notable inventor based in Wuhan, China, recognized for his contributions to the field of polishing technology. With a total of six patents to his name, Zhu has made significant advancements in the development of polyurethane polishing layers and pads.
Latest Patents
Zhu's latest patents include innovative products such as a polyurethane polishing layer, a polishing pad comprising this polishing layer, and methods for preparing and planarizing materials. The polyurethane polishing layer features a coefficient of thermal expansion of 100-200 ppm/°C and is created from a reaction product of multiple components, including an isocyanate-terminated prepolymer, hollow microsphere polymer, and a curing agent composition. This layer boasts a density of 0.6-1.1 g/cm, a Shore hardness of 45-70D, and an elongation at break of 50-450%. The preparation process is designed to be simple, cost-effective, and energy-efficient, resulting in a product with high hydrolytic stability and a uniform density. Additionally, Zhu has developed a weather-resistant polishing pad that includes an upper layer for polishing, a buffer layer, and a transparent base, all bonded with a pressure-sensitive adhesive.
Career Highlights
Throughout his career, Shunquan Zhu has worked with prominent companies such as Hubei Dinglong Chemical Co., Ltd. and Hubei Dinghui Microelectronics Materials Co., Ltd. His work in these organizations has allowed him to refine his expertise in chemical-mechanical planarization treatments.
Collaborations
Zhu has collaborated with notable colleagues, including Yubin Wang and Yijie Luo, contributing to the advancement of polishing technologies.
Conclusion
Shunquan Zhu's innovative work in the field of polishing technology has led to the development of advanced materials and methods that enhance efficiency and effectiveness in chemical-mechanical planarization. His contributions continue to impact the industry positively.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile