Shunichiro Sato

Title: Shunichiro Sato: Innovator in Semiconductor Technology

Introduction

Shunichiro Sato is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patents. With a total of 2 patents, Sato has demonstrated his expertise and commitment to advancing technology.

Latest Patents

Sato's latest patents include an electrically conductive adhesive agent composition and a process for fabricating semiconductor devices with low-resistive contacts. The electrically conductive adhesive agent composition features a metal particle and a specific organophosphorus compound. The metal particle consists of a first metal particle made from a single metal or an alloy of metals such as copper, nickel, aluminum, and tin. His second patent focuses on creating a miniature contact within a semiconductor device, which facilitates the transfer of electric signals. This process involves using ion bombardment to make a surface portion of a single crystal silicon region amorphous, followed by the deposition of titanium to form a low-resistive ohmic contact.

Career Highlights

Throughout his career, Sato has worked with notable companies, including NEC Corporation and The Furukawa Electric Co., Ltd. His experience in these organizations has contributed to his development as an inventor and has allowed him to refine his skills in semiconductor technology.

Collaborations

Sato has collaborated with esteemed colleagues such as Toshiki Shinmura and Yoshiaki Yamada. These partnerships have likely enhanced his innovative capabilities and broadened his impact in the field.

Conclusion

Shunichiro Sato is a distinguished inventor whose work in semiconductor technology has led to significant advancements. His innovative patents and collaborations reflect his dedication to improving electronic devices and their functionalities.