Shun Nakano

Title: Shun Nakano: Inventor in Chemical Mechanical Polishing

Introduction

Shun Nakano is an inventor associated with Aichi, Japan, and Toagosei Co., Ltd. His work includes a patent for a dispersant and polishing agent composition used in chemical mechanical polishing. The available information identifies 1 patent associated with him.

Latest Patents

Nakano’s listed patent, “Dispersant and Polishing Agent Composition,” concerns a dispersant for chemical mechanical polishing that helps flatten the surface of an insulating layer, a wiring layer, or both. The dispersant includes a block copolymer with polymer blocks A and B. Block A contains structural units derived from at least one amide group-containing or ester group-containing vinyl monomer, while block B contains a structural unit with an ionic functional group.

Career Highlights

The listed patent connects Nakano’s inventive work with materials and processes for polishing surfaces in electronic manufacturing. The available details associate him with Toagosei Co., Ltd., but do not provide further information about his role or career history.

Collaborations

Akihiro Goto and Sachiko Imura are identified as Nakano’s coworkers. The provided information does not specify their roles in the patent or the nature of their collaboration.

Conclusion

Shun Nakano’s listed invention focuses on a block-copolymer dispersant designed for chemical mechanical polishing, reflecting a contribution to materials used in surface-flattening processes.