The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 17, 2026
Filed:
Jun. 01, 2022
Applicant:
Toagosei Co., Ltd., Tokyo, JP;
Inventors:
Akihiro Goto, Aichi, JP;
Sachiko Imura, Aichi, JP;
Shun Nakano, Aichi, JP;
Ryutaro Tsubouchi, Aichi, JP;
Assignee:
TOAGOSEI CO., LTD., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09G 1/02 (2006.01); C08L 53/00 (2006.01); C09K 23/22 (2022.01); H01L 21/321 (2006.01);
U.S. Cl.
CPC ...
C09G 1/02 (2013.01); C08L 53/00 (2013.01); C09K 23/22 (2022.01); H01L 21/3212 (2013.01);
Abstract
A dispersant for chemical mechanical polishing that flattens a surface of at least one of an insulating layer and a wiring layer includes a block copolymer (P) having a polymer block A and B. The polymer block A has a structural unit derived from at least one monomer selected from the group consisting of an amide group-containing vinyl monomer and an ester group-containing vinyl monomer, and the polymer block B has a structural unit having an ionic functional group.