Shun-Der Wu

Title: The Innovative Contributions of Shun-Der Wu in Lithography Technology

Introduction: Shun-Der Wu is a prominent inventor based in Tainan, Taiwan, known for his significant contributions to the field of lithography technology. With a total of five patents to his name, Wu has been instrumental in advancing the methods and systems used in semiconductor manufacturing. His innovative work is primarily associated with his role at Taiwan Semiconductor Manufacturing Company Ltd., where he collaborates with a talented team of engineers and researchers.

Latest Patents: Among Shun-Der Wu's latest inventions is the development of an Extreme Ultraviolet (EUV) lithography system and method designed to optimize throughput and stability. This cutting-edge lithography method focuses on improving the efficiency of exposure processes by generating a plurality of target material droplets. Notably, the radiation generated from these droplets is adjusted based on a dose margin, which controls how many of the droplets are utilized for exposure. The method introduces an innovative inter-compensation operation that designates the excitation state of target material droplets across different bursts to compensate for energy characteristics, thereby enhancing overall lithography performance.

Career Highlights: Shun-Der Wu has garnered recognition for his inventive capabilities while working at Taiwan Semiconductor Manufacturing Company Ltd. His research in lithography has not only led to patents but has also positioned him as a thought leader in the field. His expertise has made significant strides in addressing the challenges faced in semiconductor manufacturing technologies.

Collaborations: Throughout his career, Wu has worked alongside notable colleagues, including Jeng-Horng Chen and Yen-Cheng Lu. This collaborative environment has fostered the exchange of ideas, leading to innovative solutions and advancements in lithography processes within the semiconductor industry.

Conclusion: Shun-Der Wu's contributions to lithography technology are commendable and demonstrate his dedication to innovation in semiconductor manufacturing. With a focus on developing methods that enhance throughput and stability in lithography processes, Wu continues to influence the future of technology in impactful ways. His patents are a testament to his inventive spirit and commitment to excellence in the field.