This inventor holds 1 USPTO granted patent. Top assignee: Matsushita Electric Industrial Co., Ltd.. Active years: 1991.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1991
Title: Shuichi Tanimura: Innovator in Interconnection Structures
Introduction
Shuichi Tanimura is a notable inventor based in Hirakata, Japan. He has made significant contributions to the field of semiconductor technology, particularly in the fabrication of interconnection structures. His innovative methods have paved the way for advancements in electronic devices.
Latest Patents
Shuichi Tanimura holds a patent for a "Method for fabricating interconnection structure." This patent discloses a method that includes depositing an aluminum or aluminum alloy film on a dielectric film using a sputtering method that improves step coverage. The process also involves transforming the aluminum film or a layered metal film into a metal line and depositing a high melting point metal or alloy on the top and side surfaces of the line.
Career Highlights
Tanimura is associated with Matsushita Electric Industrial Co., Ltd., a company known for its innovations in electronics and technology. His work has contributed to the development of more efficient interconnection structures, which are crucial for the performance of modern electronic devices.
Collaborations
He has collaborated with notable coworkers such as Hiroshi Yamamoto and Tsutomu Fujita, who have also made significant contributions to the field of semiconductor technology.
Conclusion
Shuichi Tanimura's work in the fabrication of interconnection structures exemplifies the importance of innovation in the electronics industry. His contributions continue to influence the development of advanced technologies.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile