Miyagi, Japan

Shuhei Akahane

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Tokyo Electron Limited. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shuhei Akahane. Retrieved from https://idiyas.com/inventor/shuhei-akahane

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: The Innovations of Shuhei Akahane

Introduction

Shuhei Akahane is a notable inventor based in Miyagi, Japan. He has made significant contributions to the field of substrate processing systems. His work focuses on enhancing the efficiency and effectiveness of plasma processing techniques.

Latest Patents

Shuhei Akahane holds a patent for a substrate processing system, information processing apparatus, and information processing method for dynamic control of substrate plasma processing. This innovative system includes an acquiring unit that collects various types of time-series data during plasma processing. It also features a learning unit that generates learned abnormal value detection models based on the data density of the acquired time-series data. Additionally, a quantification unit is included to assess the processing space state by analyzing the time-series data.

Career Highlights

Shuhei Akahane is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work at the company has allowed him to develop cutting-edge technologies that contribute to advancements in substrate processing.

Collaborations

Shuhei collaborates with talented coworkers, including Ryu Nagai and Koki Tanaka. Their combined expertise fosters an environment of innovation and creativity within their projects.

Conclusion

Shuhei Akahane's contributions to substrate processing technology exemplify the impact of innovative thinking in the field. His patent and collaborative efforts continue to drive advancements in plasma processing systems.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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