Shuangshuang Pu

Title: Innovations by Inventor Shuangshuang Pu in Semiconductor Technology

Introduction

Shuangshuang Pu is a prominent inventor based in Beijing, China, known for his contributions to the field of semiconductor technology. With a total of three patents to his name, he has made significant advancements, particularly in the design and fabrication of field effect transistors.

Latest Patents

One of Shuangshuang Pu's latest innovations is a **Field Effect Transistor with a Vertical Channel and Fabrication Method Thereof**. This invention features a circular ring-shaped silicon platform that is positioned perpendicularly to the substrate. The design includes a polysilicon source at the upper end of this platform, a drain at the lower end, and a gate on the outer side surface, while the inside is filled with dielectric material. This unique structure effectively suppresses the short channel effect, optimizing performance compared to traditional vertical structure MOSFETs.

Another recent patent is a **Method for Fabricating Semiconductor Nano Circular Ring**. In this method, a positive photoresist is first applied to a semiconductor substrate, and then exposed through a micrometer-sized circular mask, resulting in a circular ring-shaped photoresist. Plasma etching is executed under the protection of this ring-shaped photoresist, creating a nano-sized circular ring structure on the substrate. This innovative approach leverages micrometer-sized technologies and significantly reduces fabrication costs.

Career Highlights

Shuangshuang Pu is affiliated with Peking University, where he engages in groundbreaking research in semiconductor technology. His work focuses on the development of efficient fabrication methods and innovative transistor designs, which have far-reaching implications for electronic device performance.

Collaborations

Throughout his career, Shuangshuang has collaborated with notable colleagues, including Ru Huang and Zhihua Hao. These partnerships have enriched his research experience and led to the successful development of impactful technologies within the semiconductor industry.

Conclusion

Shuangshuang Pu exemplifies the spirit of innovation in the semiconductor field with his latest patents and collaborative efforts. His work continues to push the boundaries of technology, contributing to the advancement of electronic devices and offering potential solutions to current challenges in the industry.