Shuangqing Wang

Title: Shuangqing Wang: Innovator in Molecular Glass Photoresists

Introduction

Shuangqing Wang is a prominent inventor based in Beijing, China. He has made significant contributions to the field of photoresists, particularly through his innovative work on molecular glass photoresists. His expertise and research have led to advancements that are crucial for modern lithography techniques.

Latest Patents

Wang holds a patent titled "Molecular glass photoresists containing bisphenol A framework and method for preparing the same and use thereof." This invention provides a class of molecular glass photoresists that utilize bisphenol A as a main structure. The formulation includes a photoacid generator, a cross-linking agent, a photoresist solvent, and other additives, resulting in a positive or negative photoresist. The photoresist is applied to a silicon wafer through spin-coating, creating a uniform thickness. This formulation is applicable in various lithography methods, including 248 nm photolithography, 193 nm photolithography, extreme-ultraviolet (EUV) lithography, nanoimprint lithography, and electron beam lithography, with particular emphasis on EUV-lithography techniques. Wang has 1 patent to his name.

Career Highlights

Shuangqing Wang is affiliated with the Chinese Academy of Sciences, where he conducts his research and development. His work has been instrumental in advancing the capabilities of photoresists used in cutting-edge lithography processes.

Collaborations

Wang has collaborated with notable colleagues, including Guoqiang Yang and Jian Xu, contributing to a dynamic research environment that fosters innovation and development in the field of molecular glass photoresists.

Conclusion

Shuangqing Wang's contributions to the field of molecular glass photoresists highlight his role as an innovator in modern lithography. His work continues to influence advancements in technology and research.