Shuai Zhang

Title: Shuai Zhang - Innovator in Semiconductor Technology

Introduction

Shuai Zhang is a prominent inventor based in Hefei, China. He has made significant contributions to the field of semiconductor technology. His innovative work has led to the development of a unique semiconductor structure and fabrication method.

Latest Patents

Shuai Zhang holds a patent for a semiconductor structure and method for fabricating the same. This patent describes a semiconductor structure that includes a base substrate with a trench. The trench features a gate structure whose top surface is lower than the trench's top surface. The design incorporates first etch stop layers that cover the gate structure's top surface, part of the trench's side wall, and the upper surface of the base substrate. Additionally, an enclosed isolation structure is positioned between the first etch stop layers in the trench, effectively plugging an opening of the trench. An air gap is also included, positioned between the first etch stop layer and the enclosed isolation structure, which enhances the overall functionality of the semiconductor device.

Career Highlights

Shuai Zhang is currently employed at Changxin Memory Technologies, Inc. His work at this company has allowed him to further his research and development in semiconductor technologies. He has been instrumental in advancing the company's innovative projects.

Collaborations

Shuai Zhang collaborates with talented coworkers, including Wei Wan and Chunyu Xiu. Their combined expertise contributes to the success of their projects and the advancement of semiconductor technology.

Conclusion

Shuai Zhang is a key figure in the semiconductor industry, with a focus on innovative structures and methods. His contributions continue to shape the future of technology in this field.