Shu-Ying Lu

Title: The Innovative Contributions of Shu-Ying Lu

Introduction

Shu-Ying Lu, an accomplished inventor based in Hsinchu Hsien, Taiwan, has made significant strides in the field of semiconductor technology. With a total of two patents to his name, his work focuses on advancing the efficiency and functionality of semiconductor devices.

Latest Patents

Lu's latest patents showcase his innovative approach to semiconductor design and manufacturing. His first patent, titled "Structure of a Bonding Pad for Semiconductor Devices," details a sophisticated bonding pad structure. This invention includes a substrate, a dielectric layer over the substrate, and multiple metal layers, enhancing connectivity within semiconductor devices through strategically placed plugs.

The second patent, "Method of Fabricating Mixed-Mode Device," introduces a novel technique for fabricating mixed-mode devices. It involves forming a first and second gate oxide layer while utilizing a polysilicon layer as a mask. This method allows for precise control over the thickness of the gate oxide layers through a single oxidation operation, ensuring improved device performance.

Career Highlights

Shu-Ying Lu is currently employed at United Integrated Circuits Corporation, where he applies his expertise in semiconductor technology to drive innovation. His work is pivotal in creating advanced solutions that meet the growing demands of the technology industry.

Collaborations

Throughout his career, Lu has collaborated with esteemed colleagues such as Chang-Ming Lu and Jau-Hone Lu. These collaborations have fostered a rich exchange of ideas and have propelled advancements in semiconductor research and development.

Conclusion

Shu-Ying Lu exemplifies the spirit of innovation in the semiconductor sector. His innovative patents and collaborative efforts continue to enhance the functionality and efficiency of semiconductor devices, solidifying his place as a key contributor in the field. With a commitment to pushing technological boundaries, Lu’s work will undoubtedly leave a lasting impact on the industry.