Tainan, Taiwan

Shu Yen Kung

This inventor holds 1 USPTO granted patent and 4 published patent applications. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shu Yen Kung. Retrieved from https://idiyas.com/inventor/shu-yen-kung

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2026

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Innovations by Shu Yen Kung

Introduction

Shu Yen Kung is an inventor based in Tainan City, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the area of deep trench isolation structures. His work focuses on enhancing the performance of photodiodes and image sensors through innovative fabrication methods.

Latest Patent Applications

Shu Yen Kung has filed several notable patent applications, including:

1. **DEEP TRENCH ISOLATION STRUCTURE AND METHODS FOR FABRICATION THEREOF** - This application describes a structure that includes multiple photodiode doping regions formed in a substrate, along with a deep trench isolation (DTI) structure that separates these regions. The DTI structure is designed with a first filling material that defines an air gap, enhancing the overall performance of the device.

2. **STEPPED BACK SIDE DEEP TRENCH ISOLATION STRUCTURE** - This application outlines a method for forming trenches using a two-etch process, resulting in a back side deep trench isolation (BDTI) structure. The design features a step change in width between the upper and lower parts of the trenches, which improves optical performance characteristics for image sensors.

Conclusion

Shu Yen Kung's innovative approaches in semiconductor technology demonstrate his commitment to advancing the field. His latest patent applications reflect his focus on improving device performance through novel fabrication techniques.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…