Shu Wen Wang

Title: The Innovative Contributions of Shu Wen Wang

Shu Wen Wang is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology. His work has led to advancements that enhance the performance and efficiency of semiconductor devices.

Latest Patents

Shu Wen Wang holds a patent for a method titled "Forming source and drain features in semiconductor devices." This innovative method involves forming a first portion of a spacer layer over a first fin and a second portion of the spacer layer over a second fin. The process includes performing a first etching to recess the first portion of the spacer layer, creating first spacers on the sidewalls of the first fin. Subsequently, a second etching process is performed to recess the second portion of the spacer layer, forming second spacers on the sidewalls of the second fin. Notably, the second spacers are designed to be taller than the first spacers. The method culminates in the formation of a first epitaxial source/drain feature and a second epitaxial source/drain feature, with the first feature being larger than the second. This patent showcases his expertise in semiconductor fabrication techniques.

Career Highlights

Shu Wen Wang is associated with Taiwan Semiconductor Manufacturing Company Limited, a leading player in the semiconductor industry. His role at the company has allowed him to work on cutting-edge technologies that drive innovation in semiconductor manufacturing. His contributions have been instrumental in advancing the capabilities of semiconductor devices.

Collaborations

Shu Wen Wang has collaborated with notable colleagues, including Chih-Teng Liao and Chih-Shan Chen. These collaborations have fostered a productive environment for innovation and have led to significant advancements in their field.

Conclusion

In summary, Shu Wen Wang is a distinguished inventor whose work in semiconductor technology has resulted in valuable patents and contributions to the industry. His innovative methods continue to influence the development of advanced semiconductor devices.