Tai-Chung, Taiwan

Shu-Hua Hu


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2007

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Innovations by Shu-Hua Hu: Method of Forming a Wear-Resistant Dielectric Layer

Introduction: Shu-Hua Hu is an accomplished inventor based in Tai-Chung, Taiwan, recognized for his significant contributions to modern technology through his innovative patent. With one notable patent to his name, he has showcased his expertise in the field of semiconductor technology.

Latest Patents: Shu-Hua Hu’s sole patent, titled "Method of forming a wear-resistant dielectric layer," focuses on enhancing the durability and performance of semiconductor substrates. In this innovative process, a substrate featuring multiple devices and contact pads is treated through a series of advanced techniques. The method involves initial surface treatment using plasma etching, followed by a plasma enhanced chemical vapor deposition (PECVD) process. This technique operates in a high frequency/low frequency alternating manner, ensuring the formation of a robust dielectric layer on the substrate's surface. The process further includes creating a masking pattern and performing an anisotropic etching to expose the contact pads, meticulously designed with an outwardly-inclined sidewall.

Career Highlights: Shu-Hua Hu is affiliated with Touch Micro-system Technology Corp., a company known for its innovation in micro-system technologies. His role involves extensive research and development, which enables him to push the boundaries of current semiconductor applications. His expertise has been instrumental in the company's advancements in wear-resistant materials.

Collaborations: Throughout his career, Shu-Hua Hu has collaborated with notable colleagues, including Wei-Shun Lai and Kuan-Jui Huang. These collaborations have fostered an environment of creativity and innovation, allowing for the exchange of ideas and the acceleration of technological advancements within their projects.

Conclusion: Shu-Hua Hu's inventive work, particularly in the patent for the formation of wear-resistant dielectric layers, exemplifies his commitment to enhancing semiconductor technologies. His contributions, along with valuable partnerships, underscore the importance of innovation in addressing the challenges faced in modern electronics. Through his work at Touch Micro-system Technology Corp., Hu continues to pave the way for future developments in the industry.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…