Hsinchu, Taiwan

Shrane Ning Jenq

This inventor holds 1 USPTO granted patent and 3 published patent applications. Top assignee: Entegris, Inc.. Active years: 2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shrane Ning Jenq. Retrieved from https://idiyas.com/inventor/shrane-ning-jenq

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2020

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1 patent (USPTO):Explore Patents

Title: Innovations by Shrane Ning Jenq in Microelectronics Cleaning Solutions

Introduction

Shrane Ning Jenq, an accomplished inventor based in Hsinchu County, Taiwan, has made significant contributions to the field of microelectronics. With one patent to his name, he has developed specialized cleaning formulations that address the unique challenges encountered in the semiconductor industry, particularly in relation to chemical mechanical polishing (CMP) processes.

Latest Patents

Shrane's notable patent, titled "Post chemical mechanical polishing formulations and method of use," presents a novel cleaning composition and procedure designed to effectively remove post-CMP residues and contaminants from microelectronic devices. This innovation is particularly remarkable as the cleaning compositions are substantially devoid of alkali hydroxides, alkaline earth metal hydroxides, and tetramethylammonium hydroxide. The formulation ensures a highly efficient cleaning of the residues without compromising the integrity of low-k dielectric materials or copper interconnect materials used in microelectronics.

Career Highlights

Shrane Ning Jenq is employed at Entegris, Inc., a leading company that focuses on materials solutions and contamination control for the semiconductor industry. Throughout his career, Shrane has consistently demonstrated a commitment to advancing cleaning technologies, significantly influencing manufacturing processes and product quality within the sector.

Collaborations

In his endeavor to innovate, Shrane collaborates with talented professionals such as Laisheng Sun and Peng Zhang. Their collective expertise not only fosters a productive work environment but also drives the development and refinement of groundbreaking products in microelectronics manufacturing.

Conclusion

Shrane Ning Jenq's contributions to the field of microelectronics, particularly through his innovative patent, exemplify the importance of effective cleaning solutions in semiconductor manufacturing. As he continues to work at Entegris, Inc. alongside his colleagues, Shrane remains a vital player in shaping the future of the industry, enhancing product performance, and ensuring the reliability of microelectronic devices.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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