This inventor holds 1 USPTO granted patent. Top assignees: Hatachi Ltd, Hitachi Microcomputer Engineering, Ltd.. Active years: 1988.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:

Years Active: 1988
Title: The Innovations of Shozo Hosoda
Introduction
Shozo Hosoda is a notable inventor based in Tachikawa, Japan. He is recognized for his contributions to the field of semiconductor technology. His innovative work has led to the development of a significant patent that enhances the fabrication process of semiconductor devices.
Latest Patents
Hosoda holds a patent for a process of fabricating a semiconductor insulated circuit device. This patent describes a method where a conductive layer is formed by covering a polycrystalline silicon layer with a refractory metal layer or a silicide layer. The process includes the formation of a second insulating film that prevents the peeling of the conductive layer from the polycrystalline silicon layer during the glass flow, ensuring the integrity of the device.
Career Highlights
Throughout his career, Hosoda has worked with prominent companies such as Hitachi Ltd and Hitachi Microcomputer Engineering, Ltd. His experience in these organizations has contributed to his expertise in semiconductor technology and innovation.
Collaborations
Some of his notable coworkers include Yoshiaki Yoshiura and Yoku Kaino. Their collaboration has likely fostered an environment of innovation and technological advancement.
Conclusion
Shozo Hosoda's contributions to semiconductor technology through his patent and career achievements highlight his role as an influential inventor. His work continues to impact the field, showcasing the importance of innovation in technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile