Yamato, Japan

Shotaro Ohno


 

Average Co-Inventor Count = 3.3

ph-index = 4

Forward Citations = 50(Granted Patents)


Location History:

  • Los Gatos, CA (US) (2007)
  • Yamato, JP (2006 - 2009)
  • Fujisawa, JP (2014 - 2016)
  • Tokyo, JP (2008 - 2022)

Company Filing History:


Years Active: 2006-2022

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17 patents (USPTO):

Title: Shotaro Ohno: Innovator in Functional Polyamide Technologies

Introduction

Shotaro Ohno is a prominent inventor based in Yamato, Japan, known for his significant contributions to the field of functional polyamide materials. With a total of 17 patents to his name, Ohno has made remarkable advancements in the development of innovative materials that enhance various applications.

Latest Patents

Among his latest patents, Ohno has developed a functional polyamide sheet designed to minimize the generation of air bubbles during the manufacturing of polarizing and photochromic functional sheets. This invention includes a protective layer formed by a polyamide resin, which significantly improves the quality of the final product. Additionally, he has created a polymer film that effectively eliminates moire and glitter, making it suitable for use as a diffusion film in display technologies. This polymer film features specific roughness parameters that enhance its performance.

Career Highlights

Throughout his career, Shotaro Ohno has worked with notable companies such as Hitachi, Ltd. and Mitsubishi Gas Chemical Company, Inc. His experience in these organizations has allowed him to refine his expertise in material science and innovation.

Collaborations

Ohno has collaborated with esteemed colleagues, including Akinobu Shimada and Hideo Tabuchi, contributing to the advancement of technology in his field.

Conclusion

Shotaro Ohno's innovative work in functional polyamide technologies has positioned him as a key figure in material science. His patents reflect a commitment to enhancing product quality and performance across various applications.

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