Nirasaki, Japan

Shota Ishibashi

USPTO Granted Patents = 10 

Average Co-Inventor Count = 2.6

ph-index = 1


Location History:

  • Nirasaki, JP (2022 - 2023)
  • Yamanashi, JP (2023 - 2024)

Company Filing History:


Years Active: 2022-2025

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10 patents (USPTO):Explore Patents

Title: Shota Ishibashi: Innovator in Substrate Processing Technologies

Introduction

Shota Ishibashi is a prominent inventor based in Nirasaki, Japan. He has made significant contributions to the field of substrate processing, holding a total of 10 patents. His innovative work has advanced the technology used in various applications, particularly in the semiconductor industry.

Latest Patents

Ishibashi's latest patents include a substrate processing method and apparatus. This method involves a substrate processing apparatus that features at least two targets and magnet-moving mechanisms. These mechanisms are designed to reciprocate a magnet on the back surface of each target, while a substrate moving mechanism moves the substrate in an orthogonal direction. The method allows for the magnets to reciprocate at different phases, enhancing processing efficiency.

Another notable patent is for a sputtering apparatus. This apparatus consists of a first and second target that emit sputter particles, along with a substrate support. A shielding plate is positioned between the targets and the substrate, featuring a through-hole for the sputter particles. The obstructing mechanism within the apparatus ensures that sputter particles from one target do not interfere with those from the other, optimizing the sputtering process.

Career Highlights

Shota Ishibashi is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work at the company has been instrumental in developing advanced technologies that improve substrate processing methods.

Collaborations

Ishibashi has collaborated with notable colleagues, including Hiroyuki Toshima and Tatsuo Hirasawa. Their combined expertise has contributed to the successful development of innovative technologies in the field.

Conclusion

Shota Ishibashi's contributions to substrate processing technologies have made a significant impact in the semiconductor industry. His innovative patents and collaborations with esteemed colleagues highlight his role as a leading inventor in this field.

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