Shoji Sudo

Title: The Innovations of Shoji Sudo

Introduction

Shoji Sudo is a prominent inventor based in Gifu, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His work focuses on improving the performance and reliability of semiconductor devices.

Latest Patents

One of his latest patents is for a semiconductor device having a silicon oxide film. This innovative device is designed to enhance the working life of semiconductors. It comprises a first conductive layer, a second conductive layer, and a silicon oxide film that contains chlorine. This design inhibits the formation of electron traps while allowing a large number of holes to form during the initial stages of electron injection into the silicon oxide film.

Another notable patent is for a transistor and semiconductor memory, along with a method of fabricating the same. In this invention, a plurality of source/drain regions are formed on a silicon substrate. Floating gate electrodes are strategically placed on the sides of a channel region, and a control gate electrode is formed over the channel region and floating gate electrodes. This design enhances the functionality and efficiency of semiconductor devices.

Career Highlights

Shoji Sudo has been associated with Sanyo Electric Co., Ltd., where he has contributed to various innovative projects. His expertise in semiconductor technology has positioned him as a key figure in the industry.

Collaborations

He has collaborated with notable coworkers, including Hideaki Fujiwara and Hideharu Nagasawa. Their combined efforts have led to advancements in semiconductor technology and improved device performance.

Conclusion

Shoji Sudo's contributions to semiconductor technology through his patents demonstrate his innovative spirit and commitment to enhancing electronic devices. His work continues to influence the field and pave the way for future advancements.