Location History:
- Fuchu, JP (2013)
- Tokyo, JP (2010 - 2018)
Company Filing History:
5 out of 442 
4 out of 986 
4 out of 10,341 
Years Active: 2010-2018
Title: Innovator Spotlight: Shoichi Hino - Pioneering Flow Rate Control Technology
Introduction: Shoichi Hino is a distinguished inventor based in Tokyo, JP, renowned for his groundbreaking work in the field of flow rate control technology. With an impressive portfolio of 5 patents, Hino has made significant contributions to the advancement of fluid dynamics and control systems.
Latest Patents: Among his latest patents is the "Flow Rate Range Variable Type Flow Rate Control Apparatus," a pressure type flow rate control device that revolutionizes fluid flow management. This innovative apparatus features multiple fluid passages with orifices of varying characteristics, enabling precise control of flow rates in both small and large quantity areas.
Career Highlights: Hino's expertise has been honed through his tenure at prominent companies such as Fujikin Inc. and Tokyo Electron Limited. His relentless pursuit of innovation and excellence has led to the development of cutting-edge technologies that have transformed the way flow rate control is approached in industrial applications.
Collaborations: Throughout his career, Hino has collaborated with esteemed colleagues such as Kouji Nishino and Katsuyuki Sugita. Together, they have leveraged their collective expertise to push the boundaries of flow rate control technology and deliver solutions that address the evolving needs of the industry.
Conclusion: Shoichi Hino's inventive spirit and dedication to advancing flow rate control technology have solidified his reputation as a trailblazer in the field. His patented inventions continue to shape the landscape of fluid dynamics, offering innovative solutions that drive efficiency and precision in industrial processes.