Company Filing History:
Years Active: 1993-2000
Title: Shizuo Oguro: Innovator in Semiconductor Technology
Introduction
Shizuo Oguro is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 7 patents. His work focuses on innovative methods and devices that enhance the performance and efficiency of semiconductor materials.
Latest Patents
One of his latest patents is a method of facet-free selective silicon epitaxy. This technique allows for the growth of a flat selective silicon epitaxial thin film, suppressing facet formation and loading effects. The process utilizes a conventional LPCVD system, eliminating the need for an ultrahigh vacuum environment. The raw material gases for film formation, along with atomic hydrogen generated in a separate chamber, are introduced into the reaction chamber at growth temperatures ranging from 750 to 900 degrees Celsius and under pressures between 1 and 30 Torr.
Another notable patent is for a semiconductor memory device featuring trench isolation regions. This device includes multiple memory cells, each defined by trench isolation regions formed in a semiconductor substrate. The design incorporates an active region, isolation gate conductor lines, and a storage capacitor, all contributing to the device's functionality and efficiency.
Career Highlights
Shizuo Oguro is currently employed at NEC Corporation, where he continues to push the boundaries of semiconductor technology. His innovative approaches have garnered attention in the industry, making him a respected figure among his peers.
Collaborations
Throughout his career, Oguro has collaborated with notable colleagues, including Tatsuya Suzuki and Shuichi Ohya. These partnerships have fostered a creative environment that has led to groundbreaking advancements in their field.
Conclusion
Shizuo Oguro's contributions to semiconductor technology through his patents and collaborations highlight his role as a leading inventor. His innovative methods and devices continue to shape the future of the industry.