Shizuaki Kimura

Title: Shizuaki Kimura: Innovator in Plasma Processing Technology

Introduction

Shizuaki Kimura is a notable inventor based in Kudamatsu, Japan. He has made significant contributions to the field of plasma processing technology, holding a total of 3 patents. His work focuses on advanced methods for processing plasma, which have applications in various industries.

Latest Patents

Kimura's latest patents include an "Emission spectroscopic processing apparatus and plasma processing method using it." This innovative method involves separating spectrally plasma radiation emitted from a vacuum process chamber into component spectra. It converts these component spectra into a time series of analogue electric signals composed of different wavelength components at predetermined intervals. The method further adds together analogue signals of the different wavelength components and converts a plurality of added signals into digital quantities. By digitally adding these signals multiple times, the method determines the endpoint of a predetermined plasma process based on the resulting signal, ultimately terminating the process.

Another significant patent is the "Plasma processing method using a spectroscopic processing unit." This method shares similarities with his previous patent, focusing on the separation of plasma radiation and the conversion of signals to optimize plasma processing.

Career Highlights

Throughout his career, Shizuaki Kimura has worked with prominent companies such as Hitachi, Ltd. and Hitachi High-Technologies Corporation. His experience in these organizations has allowed him to develop and refine his innovative techniques in plasma processing.

Collaborations

Kimura has collaborated with notable colleagues, including Tetsunori Kaji and Tatehito Usui. These partnerships have contributed to the advancement of his research and the successful development of his patented technologies.

Conclusion

Shizuaki Kimura's contributions to plasma processing technology demonstrate his innovative spirit and dedication to advancing the field. His patents reflect a deep understanding of the complexities involved in plasma processing, making him a significant figure in this area of research.