This inventor holds 1 USPTO granted patent. Top assignee: Showa Denko K.k.. Active years: 2023.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2023
Title: Shiyuko Nakamura: Innovator in Photosensitive Resin Technology
Introduction
Shiyuko Nakamura is a prominent inventor based in Tokyo, Japan. He is known for his contributions to the field of photosensitive resin compositions. His innovative work has led to the development of a highly sensitive black positive-type photosensitive resin composition.
Latest Patents
Nakamura holds 1 patent for his invention titled "Photosensitive Resin Composition." This patent describes a black positive-type photosensitive resin composition that includes a binder resin, a quinonediazide adduct of a phenol compound with three or more phenolic hydroxyl groups, and a black coloring agent. The composition is designed to enhance sensitivity and performance in various applications.
Career Highlights
Shiyuko Nakamura is currently employed at Showa Denko K.K., where he continues to advance his research and development efforts. His work has significantly impacted the industry, particularly in the area of photosensitive materials.
Collaborations
Nakamura collaborates with notable colleagues, including Kentaro Furue and Yuki Miyaishi. Their combined expertise fosters innovation and drives the development of new technologies in their field.
Conclusion
Shiyuko Nakamura's contributions to photosensitive resin technology exemplify the spirit of innovation. His work not only enhances the performance of materials but also paves the way for future advancements in the industry.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile