Hubei, China

Shiyuan Liu

USPTO Granted Patents = 13 

 

Average Co-Inventor Count = 4.2

ph-index = 1

Forward Citations = 3(Granted Patents)


Location History:

  • Wuhan, CN (2015 - 2020)
  • Hubei, CN (2021 - 2023)

Company Filing History:


Years Active: 2015-2025

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13 patents (USPTO):Explore Patents

Title: **Innovative Contributions of Inventor Shiyuan Liu**

Introduction

Shiyuan Liu, an accomplished inventor based in Hubei, China, has made significant contributions to the fields of lithography and optical measurements. With a total of 12 patents to his name, Liu has demonstrated expertise in developing innovative methods and systems that enhance manufacturing processes and measurement techniques.

Latest Patents

Two of Liu’s latest patents exemplify his cutting-edge work. The first patent, titled “Method and system for correcting lithography process hotspots based on stress damping adjustment,” introduces a novel approach to correcting lithography process hotspots. This method encompasses acquiring a mark hotspot of a mask pattern and forming concentric annuli on the mask. It involves the systematic adjustment of vertexes within these annuli to produce an optimized layout, followed by rigorous verification of electrical characteristics to ensure compliance within tolerable limits.

The second patent, titled “Rapid measurement method for ultra-thin film optical constant,” presents an innovative technique for measuring the optical constants of ultra-thin films quickly. The method leverages p-light and s-light amplitude reflection coefficients from incident light to derive a quartic equation, allowing for the rapid determination of optical constants through specific solving techniques.

Career Highlights

Shiyuan Liu has held key positions at esteemed institutions, notably at Huazhong University of Science and Technology and Wuhan Eoptics Technology Co., Ltd. His work at these organizations has been pivotal in advancing research and development in optical technologies and advanced manufacturing processes.

Collaborations

Throughout his career, Liu has collaborated with other prominent researchers, including Xiuguo Chen and Hao Jiang. These collaborations have fostered an environment of innovation and knowledge exchange, contributing to the success of his projects and patents.

Conclusion

In conclusion, Shiyuan Liu stands out as a prolific inventor whose patents are at the forefront of innovations in lithography and optical measurements. His contributions not only reflect his technical expertise but also his commitment to advancing technology for practical applications in various industries. As he continues to develop groundbreaking methods, Liu’s work will undoubtedly leave a lasting impact on the field.

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