This inventor holds 3 USPTO granted patents. Top assignee: Nikon Corporation. Active years: 2001-2003.
Location History:
- Kumagaya, JP (2002)
- Kawasaki, JP (2001 - 2003)
Company Filing History:
Years Active: 2001-2003
Title: Shiwen Li: Innovator in Photolithographic Technology
Introduction
Shiwen Li is a prominent inventor based in Kawasaki, Japan. She has made significant contributions to the field of photolithography, particularly in the development of projection exposure apparatuses. With a total of 3 patents to her name, her work has been instrumental in advancing manufacturing processes for various devices.
Latest Patents
One of her latest patents is focused on a projection exposure apparatus and method. This invention relates to imaging a reticle with a patterned surface onto a substrate during photolithographic processes. The apparatus includes an illumination optical system and a reticle stage designed to hold the reticle in a gravity-aligned position. Additionally, the optical system features a first imaging optical system that forms an intermediate image of the patterned surface and a second imaging optical system that creates a reduced image on the substrate. The design ensures that the optical axes are parallel to gravity, enhancing the precision of the imaging process.
Another notable patent addresses the stage device and exposure apparatus. This invention cancels out the shift in the center of gravity of a stage device and the reaction forces that occur when the stage devices move. By moving a base, the center of gravity remains stable, allowing for concurrent exposure on two substrates. This innovation improves exposure throughput and precision, making it a valuable advancement in the field.
Career Highlights
Shiwen Li is currently employed at Nikon Corporation, where she continues to innovate in the field of optical systems and photolithography. Her work has garnered attention for its practical applications in manufacturing technology.
Collaborations
Throughout her career, Shiwen has collaborated with notable colleagues, including Masatoshi Ikeda and Yasuhiro Omura. These partnerships have contributed to her success and the advancement of her inventions.
Conclusion
Shiwen Li is a trailblazer in the realm of photolithographic technology, with her inventions paving the way for enhanced manufacturing processes. Her contributions to the field are significant and continue to influence the industry.