The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 09, 2002

Filed:

Oct. 18, 2000
Applicant:
Inventor:

Shiwen Li, Kumagaya, JP;

Assignee:

Nikon Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B 2/758 ; G03B 2/742 ; H02K 4/100 ;
U.S. Cl.
CPC ...
G03B 2/758 ; G03B 2/742 ; H02K 4/100 ;
Abstract

The shift in the center of gravity of a stage device and the reaction force caused when at least one of a first and second stage devices move, are canceled out by moving a moving member. The shift in the center of gravity of a stage device and the reaction force caused when the stage devices move that cannot be canceled out by moving the moving member, are completely canceled out by moving a base. That is, even if at least one of the first and second stages move, the center of gravity of the stage device does not move, and the reaction force are reliably canceled. Accordingly, by concurrently performing exposure on the two substrates mounted on the first and second stages, the exposure throughput can be improved, and an exposure with a high precision can be performed.


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