Zhejiang, China

Shiwei Chen

This inventor holds 1 USPTO granted patent and 3 published patent applications. Top assignee: Zhejiang University. Active years: 2023.

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: Shiwei Chen: Innovator in Real-Time Defect Measurement

Introduction

Shiwei Chen is a prominent inventor based in Zhejiang, China. He has made significant contributions to the field of defect measurement through innovative methodologies. His work focuses on enhancing the accuracy of real-time measurements in various applications.

Latest Patents

Shiwei Chen holds a patent for a "Real-time traceability method of width of defect based on divide-and-conquer." This invention addresses the challenges of accurately measuring the width of defects that are close to the diffraction limit of the system. By utilizing a calibration transfer function and multidimensional eigenvector analysis technology, his method improves the real-time traceability of defect widths. The extreme random tree regression model is trained using data from electromagnetic field simulations, which enhances the precision of defect detection.

Career Highlights

Shiwei Chen is affiliated with Zhejiang University, where he continues to advance research in defect measurement technologies. His innovative approaches have garnered attention in the academic and industrial sectors. His work is instrumental in solving complex problems related to defect detection.

Collaborations

Shiwei Chen collaborates with notable colleagues, including Yongying Yang and Weimin Lou. Their combined expertise contributes to the advancement of research in their field.

Conclusion

Shiwei Chen's contributions to real-time defect measurement exemplify the impact of innovative thinking in technology. His patent reflects a significant advancement in the ability to measure defects accurately, which is crucial for various applications.

Profile summary based on public USPTO records.
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