Aichi, Japan

Shirou Miura

This inventor holds 3 USPTO granted patents. Top assignee: Fujimi Incorporated. Active years: 1998-2000.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shirou Miura. Retrieved from https://idiyas.com/inventor/shirou-miura

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.8

ph-index = 3

Forward Citations = 41(Granted Patents)


Company Filing History:


Years Active: 1998-2000

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3 patents (USPTO):Explore Patents

Title: Innovations of Shirou Miura

Introduction

Shirou Miura is a notable inventor based in Aichi, Japan. He has made significant contributions to the field of polishing compositions, holding a total of 3 patents. His work is recognized for its innovative approaches to enhancing polishing materials.

Latest Patents

Miura's latest patents include a polishing composition that comprises silicon nitride fine powder, water, and an acid. Another notable patent features a polishing composition that includes fumed silica, a basic potassium compound, and water, with a specific electric conductivity ranging from 100 to 5,500 µS/cm. These inventions reflect his commitment to advancing polishing technology.

Career Highlights

Shirou Miura is currently employed at Fujimi Incorporated, a company known for its expertise in polishing materials. His role at Fujimi has allowed him to develop and refine his innovative ideas, contributing to the company's reputation in the industry.

Collaborations

Miura has collaborated with talented coworkers such as Atsunori Kawamura and Noritaka Yokomichi. Their teamwork has fostered an environment of creativity and innovation, leading to the development of advanced polishing solutions.

Conclusion

Shirou Miura's contributions to polishing compositions demonstrate his expertise and dedication to innovation. His patents and collaborations highlight the importance of teamwork in achieving technological advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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