Aichi, Japan

Shiro Miura


Average Co-Inventor Count = 2.4

ph-index = 2

Forward Citations = 23(Granted Patents)


Company Filing History:


Years Active: 1992-2002

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2 patents (USPTO):Explore Patents

Title: Shiro Miura: Innovator in Polishing Technologies

Introduction

Shiro Miura is a notable inventor based in Aichi, Japan. He has made significant contributions to the field of polishing technologies, particularly through his innovative patents. With a total of 2 patents, Miura has developed methods and materials that enhance the efficiency and effectiveness of polishing processes.

Latest Patents

Miura's latest patents include a grinding stone and a process for its production, as well as a polishing method of goods and the abrasive pads used for this purpose. The polishing method involves the use of abrasive pads manufactured with materials such as alumina, zirconium oxide, tin oxide, and cerium oxide, with grain diameters ranging from 0.5 to 10 micrometers. The pads are coated with a water-soluble cellulose ether and an insolubilizing agent, allowing for a unique polishing process that requires only water between the rotating abrasive pad and the goods being polished.

Career Highlights

Throughout his career, Shiro Miura has worked with prominent companies in the abrasives industry, including Fujimi Abrasives Co., Ltd. and Fujimi Incorporated. His work has focused on developing advanced polishing techniques that are widely used in various applications, including lens manufacturing.

Collaborations

Miura has collaborated with notable colleagues such as Gisaburo Takizawa and Tetsushi Senda, contributing to the advancement of polishing technologies through shared expertise and innovative ideas.

Conclusion

Shiro Miura's contributions to polishing technologies through his patents and collaborations have made a significant impact in the industry. His innovative methods continue to influence the way polishing is performed, showcasing the importance of research and development in enhancing manufacturing processes.

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