Shiro Hayashi

Title: Shiro Hayashi: Innovator in Abnormality Detection and Plasma Film Technology

Introduction

Shiro Hayashi is a notable inventor based in Iwate, Japan. He has made significant contributions to the fields of abnormality detection methods and plasma film forming apparatuses. With a total of 2 patents, his work reflects a commitment to advancing technology in these areas.

Latest Patents

Hayashi's latest patents include an abnormality detection method and an abnormality detection apparatus. The abnormality detection method focuses on identifying irregularities in an AC signal sourced from an AC power supply. This method involves calculating an arithmetic value based on the ideal AC signal represented as Vsin ωt, where V is the amplitude, ω is the angular frequency, and t is time. The detection is deemed abnormal when the arithmetic value falls outside a specified threshold range.

Additionally, his patent for a mounting table structure and plasma film forming apparatus describes a design that includes a conductive mounting table body, a base table, and a high-frequency power supply line. This innovative structure is designed to enhance the efficiency of plasma film formation processes.

Career Highlights

Throughout his career, Shiro Hayashi has worked with prominent companies such as Tokyo Electron Limited and Avaldata Corporation. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking technologies.

Collaborations

Hayashi has collaborated with talented individuals in his field, including Tomoya Bessho and Junichi Harada. These partnerships have fostered innovation and the sharing of ideas, further enhancing the impact of his work.

Conclusion

Shiro Hayashi's contributions to technology through his patents and collaborations highlight his role as an influential inventor. His work in abnormality detection and plasma film technology continues to inspire advancements in these fields.