Tokyo, Japan

Shinya Ui

This inventor holds 2 USPTO granted patents and 2 published patent applications. Top assignee: Fuji Electric., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shinya Ui. Retrieved from https://idiyas.com/inventor/shinya-ui-zsdhmdv7

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 2 

Average Co-Inventor Count = 5.0


Company Filing History:


Years Active: 2026

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2 patents (USPTO):Explore Patents

Title: Shinya Ui and Geothermal Power Innovation.

Introduction

Shinya Ui is an inventor based in Tokyo, Japan, associated with Fuji Electric Co., Ltd. His work includes a patented approach to geothermal power generation and silica scale control.

Latest Patents

Ui is credited with 1 patent: “Geothermal Power Generation System and Silica Scale Deposition Control Method.” The invention describes a system that separates geothermal fluid into steam and hot water, uses the steam to drive a turbine, and returns geothermal fluid to a reinjection well. It measures the hot water’s pH and temperature, as well as the fluid’s temperature at a selected point. A control device uses these measurements to regulate the injection of an alkaline chemical, helping control silica scale deposition.

Career Highlights

Ui’s patent addresses an operational challenge in geothermal power systems: silica scale can deposit as geothermal fluids circulate through equipment. The invention combines measurement and controlled chemical injection to manage that risk.

Collaborations

Ui’s listed coworkers include Taichiro Kato and Azusa Ozawa. His company affiliation is Fuji Electric Co., Ltd.

Conclusion

Shinya Ui’s patented system brings together geothermal fluid monitoring and controlled alkaline chemical injection to help manage silica scale deposition in power generation.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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