Osaka, Japan

Shinya Tada

This inventor holds 2 USPTO granted patents. Top assignee: Matsushita Electric Industrial Co., Ltd.. Active years: 2004-2005.


Average Co-Inventor Count = 5.0

ph-index = 2

Forward Citations = 35(Granted Patents)


Location History:

  • Hirakata, JP (2004)
  • Osaka, JP (2005)

Company Filing History:


Years Active: 2004-2005

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2 patents (USPTO):Explore Patents

Title: Shinya Tada: Innovator in Semiconductor Technology

Introduction

Shinya Tada is a prominent inventor based in Osaka, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on enhancing the performance and efficiency of semiconductor devices.

Latest Patents

Tada's latest patents include innovative designs for semiconductor devices. One of his patents describes a semiconductor device that incorporates a layer with a β-crystal structure. This design features a barrier layer formed on an insulating or conducting film provided on a semiconductor substrate. An electrode or interconnect made from a conducting film is then formed on this barrier layer, which includes a tantalum film exhibiting the β-crystal structure. Another patent outlines a similar approach, emphasizing the importance of the barrier layer in semiconductor device fabrication.

Career Highlights

Shinya Tada has had a successful career at Matsushita Electric Industrial Co., Ltd., where he has been instrumental in advancing semiconductor technologies. His expertise and innovative thinking have led to the development of cutting-edge solutions that address the challenges faced in the semiconductor industry.

Collaborations

Throughout his career, Tada has collaborated with notable colleagues, including Takenobu Kishida and Atsushi Ikeda. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

Shinya Tada's contributions to semiconductor technology are noteworthy, and his patents reflect his commitment to innovation. His work continues to influence the industry, paving the way for future advancements in semiconductor devices.

Profile summary based on public USPTO records.
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