Company Filing History:
Years Active: 2012-2013
Title: Shinya Kiura: Innovator in Electromagnetic Wave Shielding Materials
Introduction
Shinya Kiura, an accomplished inventor based in Tokyo, Japan, has made significant contributions to the field of electromagnetic wave shielding. With a total of two patents to his name, his innovations focus on developing materials and methods that enhance performance in electromagnetic interference applications.
Latest Patents
Kiura's latest patents revolve around the creation of advanced electromagnetic wave shielding materials. One patent provides a comprehensive design for an electromagnetic wave shielding material that includes a transparent substrate and a convex pattern layer composed of a conductive composition. This innovative composition not only contains conductive particles and a binder resin but also offers a configuration that achieves lower surface resistivity. This is crucial for reducing the line width of patterns to no more than 30 micrometers, ideally between 15 to 20 micrometers, with a treatment method that simplifies and shortens the process.
The second patent outlines a method for manufacturing an electromagnetic shielding material featuring a conductive layer pattern transferred to a transparent base material. This method addresses common issues such as wire breakage, non-conforming shapes, and low contact integrity by ensuring a reliable transfer of the conductive composite. The construction includes a primer layer overlaying the transparent base material, promoting enhanced performance of the conductive layer due to a more considerable thickness in those areas.
Career Highlights
Shinya Kiura works at Dai Nippon Printing Co., Ltd., where he leverages his expertise to contribute to cutting-edge advancements in materials science and engineering. His commitment to innovation has positioned him as a key player in the competitive sector of electromagnetic shielding technologies.
Collaborations
Within his organization, Kiura collaborates with notable coworkers, including Yuichi Miyazaki and Yuusuke Satou. Together, they explore new ideas and enhance existing technologies, focusing on the intersection of material science and practical applications in electromagnetic wave shielding.
Conclusion
Shinya Kiura's work underscores the critical importance of innovative materials in addressing electromagnetic interference challenges. Through his patents and collaborations, he continues to push the boundaries of technology, paving the way for future advancements in the field. His contributions not only serve the industry but also offer significant implications for various applications where electromagnetic shielding is essential.