This inventor holds 1 USPTO granted patent. Top assignee: Tokyo Electron Limited. Active years: 2022.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2022
Title: Shinya Kikuchi - Innovator in Substrate Processing Technology
Shinya Kikuchi is a notable inventor based in Nirasaki, Japan. He has made significant contributions to the field of substrate processing technology. His innovative approach has led to the development of a unique cleaning method for substrate processing apparatuses.
Latest Patents
Shinya Kikuchi holds a patent for a cleaning method of a substrate processing apparatus. This patent involves a process for cleaning the inside of an exhaust pipe through which gas from a processing container is exhausted. The method includes removing deposits on both the upstream and downstream sides of an opening/closing valve in the exhaust pipe. The first step involves supplying a cleaning gas containing fluorine to the downstream side while the valve is closed. The second step requires supplying a cleaning gas that does not contain fluorine to the inside of the processing container when the valve is opened. This innovative cleaning method enhances the efficiency and effectiveness of substrate processing.
Career Highlights
Shinya Kikuchi is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work at Tokyo Electron Limited has allowed him to focus on advancing substrate processing technologies. His contributions have been instrumental in improving the performance and reliability of processing apparatuses.
Collaborations
Shinya Kikuchi has collaborated with notable colleagues such as Yoshihiro Takezawa and Daisuke Suzuki. These collaborations have fostered an environment of innovation and have led to the development of advanced technologies in the field.
Conclusion
In summary, Shinya Kikuchi is a distinguished inventor whose work in substrate processing technology has made a significant impact. His innovative cleaning method for substrate processing apparatuses exemplifies his commitment to advancing technology in this field. His contributions continue to influence the industry positively.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile