Shintoshi Gima

Title: Shintoshi Gima: Innovator in Semiconductor Technology

Introduction

Shintoshi Gima is a notable inventor based in Gumma, Japan, recognized for his contributions to semiconductor technology. With a total of two patents to his name, Gima has made significant advancements in the field of epitaxial growth and wafer manufacturing.

Latest Patents

Gima's latest patents include an epitaxial growth furnace designed to facilitate the formation of an epitaxial layer on semiconductor wafers through chemical vapor deposition (CVD). This innovative furnace features a wafer holder with an opening that exposes the surface area of the wafer for epitaxial growth, along with a flange that engages with the wafer's peripheral edge. Additionally, he has developed a compact apparatus for manufacturing semiconductor wafers, which effectively removes moisture from the wafers after final cleaning while minimizing manufacturing time. This apparatus includes a cleaning chamber, a storage chamber, and a transfer chamber equipped with a robot hand and arm for efficient wafer transportation.

Career Highlights

Gima is currently employed at Super Silicon Crystal Research Institute Corporation, where he continues to push the boundaries of semiconductor research and development. His work has been instrumental in enhancing the efficiency and effectiveness of semiconductor manufacturing processes.

Collaborations

Some of Gima's notable coworkers include Masanori Mayusumi and Masato Imai, who contribute to the innovative environment at Super Silicon Crystal Research Institute Corporation.

Conclusion

Shintoshi Gima's contributions to semiconductor technology through his patents and work at Super Silicon Crystal Research Institute Corporation highlight his role as a key innovator in the field. His advancements in epitaxial growth and wafer manufacturing continue to influence the industry significantly.