The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 17, 2003
Filed:
Sep. 24, 2001
Masanori Mayusumi, Gumma, JP;
Masato Imai, Gumma, JP;
Kazutoshi Inoue, Gumma, JP;
Shinji Nakahara, Gumma, JP;
Shintoshi Gima, Gumma, JP;
Super Silicon Crystal Research Institute Corp., Annaka, JP;
Abstract
Disclosed is a compact apparatus for manufacturing semiconductor wafers, which is aimed at complete removing of moisture from the wafers after final cleaning while reducing the manufacturing time. The apparatus includes a cleaning chamber ( ) for final cleaning, a storage chamber ( ) for storing wafers, a transfer chamber ( ) communicating with the both cleaning and storage chambers ( ), and formed in its upper wall with a heat-conducting window ( ), a robot hand ( ) and a robot arm ( ) for transporting the wafer (W) from the cleaning chamber ( ) to the storage chamber ( ) within the transfer chamber, infrared lamps ( ) arranged to face the window ( ) outside the transfer chamber ( ) so as to heat the wafer (W) in the course of transportation within the transfer chamber, gas supply ports ( ) for producing a laminar flow of inert gas from the storage chamber ( ) to the cleaning chamber ( ) to expose wafers (W) with the gas, and exhaust ports ( ) for exhausting the moisture removed from wafers.